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Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

Abstract In this thesis, a novel silica nanosphere (SNS) lithography technique has been developed to offer a fast, cost-effective, and large area applicable nano-lithography approach. The SNS can be easily deposited with a simple spin-coating process after introducing a N,N-dimethyl-formamide (DMF) solvent which can produce a highly close packed SNS monolayer over large silicon (Si) surface area, since DMF offers greatly improved wetting, capillary and convective forces in addition to slow solvent evaporation rate. Since the period and dimension of the surface pattern can be conveniently changed and controlled by introducing a desired size of SNS, and additional SNS size reduction with dry etching process, using SNS for lithography provides a highl... (more)
Created Date 2015
Contributor Choi, Jeayoung (Author) / Honsberg, Christiana (Advisor) / Alford, Terry (Advisor) / Goodnick, Stephen (Committee member) / Arizona State University (Publisher)
Subject Engineering / Energy / Lithography / Nanosphere / Nanostructure / Silicon / Solar
Type Doctoral Dissertation
Extent 160 pages
Language English
Reuse Permissions All Rights Reserved
Note Doctoral Dissertation Materials Science and Engineering 2015
Collaborating Institutions Graduate College / ASU Library
Additional Formats MODS / OAI Dublin Core / RIS

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Description Dissertation/Thesis